澳门十三第ssd0011入口「官方授权」

讲师
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张文磊

学历:博士研究生

学科:电子科学与技术

研究领域或方向:微机电系统,微纳米材料,微机电系统可靠性评价

邮箱:zhangwenlei@tyut.edu.cn

职称:讲师

  • 个人简介
  • 主要课程
  • 主要成果
  • 【学习经历】

    1.      本科:西安交通大学机械工程及自动化/日语双学位 2008~2012

    2.      硕士:西安交通大学设计及理论 2012~2015

    3.      博士:日本京都大学微细工程系 2015~2019
  • 《微纳机电系统及其应用》
  • 【项目】

    1.            OMRON Corporation, Mechanical robustness evaluation method of   MEMS microphone, 2016/03-2017/09.

    2.            Rohm Corporation, Mechanical properties of isotropic etched   silicon strcuture used for three-axis accelerometer , 2018/02-2019/01.

    3. 国家自然基金委员会青年基金项目,批准号:52005363,2021.01-2024.12

    【论文】

    1. Gang Li, Jingjing Hou, Wenlei Zhang*, Pengwei Li, Yingge   Wang, Guohua Liu, Kaiying Wang*, Graphene-bridged WO3/MoS2   Z-scheme Photocatalyst for Enhanced Photodegradation under Visible Light   Irradiation, Materials Chemistry and Physics, in publication.

    2. GangLi, Wenlei Zhang*, Jingjing Hou, Tingyu Li, Pengwei Li,   Yingge Wang, Guohua Liu, Kaiying Wang*, Enhanced Visible Light Photochemical   Activity and Stability of MoS2/Cu2O Nanocomposites by Tunable   Heterojunction, Materials Today Communications, 23, 100933 (2020).

    3. Wenlei Zhang*, Kazutaka Obitani,   Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata, Torsion Properties of a   Silicon Micromirror Fully Coated by Plasma CVD Diamond Like Carbon Film,   Sensors and Actuators A-Physical, 286, 8 (2019).

    4. Wenlei Zhang*, Yoshikazu   Hirai, Toshiyuki Tsuchiya, Osamu Tabata, Effect of Substrate Bias Voltage on   Tensile Properties of Single Crystal Silicon Microstructure Fully Coated by   Plasma CVD Diamond Like Carbon Film, Applied Surface Science, 443, 48   (2018).

    5. Wenlei Zhang*, Akio Uesugi,   Yoshikazu Hirai, Toshiyuki Tsuchiya, Osamu Tabata, Tensile Test of a Silicon   Microstructure Fully Coated with Submicrometer-thick DLC Film Using PECVD   Method, Japanese Journal of Applied Physics, 56, 06GN01 (2017).

    6. Wenlei Zhang, Dongfeng Diao*, Xue Fan, Three-layered   Sandwich Structured Carbon Film Prepared by Sputtering and Ion/electron/ion   Alternative Irradiation. Surface & Coating Technology, 278, 12   (2015).

     

    【专利】

    刁东风,张文磊,范雪,杨雷,ECR离子/电子/离子交替照射工艺制备三明治碳膜及方法,201410546752.2。

澳门十三第ssd0011入口「官方授权」